-10% for orders over PLN 1,000

Description

Discover the power of an Deep Nourishing Mask that will restore your skin's healthy glow and youthful vitality. This unique formula was created to deeply regenerate, smooth and brighten the skin, providing it with intensive hydration and protection against external factors.

Key Ingredients

  • Phytic and kojic acids – gently smooth and brighten the skin, evening out its color.
  • Ferulic acid – has an antioxidant effect, strengthening and regenerating the skin.
  • Lipoic Acid – a powerful antioxidant that protects the skin from oxidative stress and signs of aging.

Why choose our mask?

The Deep Nourishing Mask is the perfect solution for tired, dull skin exposed to external factors. Light but rich formula absorbs quickly, without weighing down the skin, and its regular use restores the skin's healthy appearance, elasticity and radiance.

How to use?

For best results, apply the mask to cleansed skin, avoiding the eye area. Leave on for 10-15 minutes, then rinse thoroughly or massage excess into the skin. You will notice the effects after the first use, and regular use will provide long-lasting results.

Composition

Deionized Water (Aqua), Glycerin, Sodium Polyacrylate, Hexylene Glycol, C12-15 Alkyl Benzoate, Ethoxydiglycol, Cyclopentasiloxane, Dimethiconol, Hydrogenated Polyisobutene, Butyrospermum Parkii (Shea Butter), Titanium Dioxide, Dipalmitoyl Hydroxyproline, Persea Gratissima (Avocado) Oil Unsaponifiables, Butylene Glycol, Sorbitan Laurate, Hydroxyethylcellulose, Acetyl Dipeptide-1 Cetyl Ester, Sodium Lactate, Sodium PCA, Polyacrylamide, C13-14 Isoparaffin, Laureth-7, Thioctic Acid, Ferulic Acid, Phytic Acid, Phenoxyethanol, Caprylyl Glycol, Hyaluronic Acid, Melatonin, Kojic Acid, Sorbitan Stearate, Chlorphenesin, Fragrance, Allantoin, Acrylates Copolymer, Cimicifuga Racemosa Root Extract, Tocopheryl Acetate, Retinyl Palmitate, Ascorbic Acid, Red #40 (CI 16035).